Peter Kuschnerus

Title: Innovations by Peter Kuschnerus in Photolithography

Introduction

Peter Kuschnerus is a notable inventor based in Jena, Germany. He has made significant contributions to the field of photolithography, particularly in the area of phase shift masks. His innovative methods have the potential to enhance the imaging properties of these critical components in semiconductor manufacturing.

Latest Patents

Kuschnerus holds a patent for a "Method for repairing phase shift masks." This invention involves a systematic approach to identifying and rectifying defects in phase shift masks used in photolithography. The method includes checking for defects, analyzing their impact on imaging properties, and improving those defects while ensuring that the imaging properties meet predetermined tolerance criteria. The process may involve multiple iterations of analysis and improvement to achieve optimal results.

Career Highlights

Peter Kuschnerus is associated with Carl Zeiss SMS Ltd., a company renowned for its advancements in optical systems and photolithography equipment. His work at this esteemed organization has allowed him to contribute to cutting-edge technologies that are essential for modern semiconductor fabrication.

Collaborations

Kuschnerus has collaborated with notable colleagues, including Axel Zibold and Oliver Kienzle. These partnerships have fostered an environment of innovation and have led to advancements in the methodologies used in photolithography.

Conclusion

Peter Kuschnerus is a distinguished inventor whose work in repairing phase shift masks has made a significant impact on the field of photolithography. His innovative methods and collaborations continue to drive advancements in semiconductor manufacturing technologies.