Peter J Fronczkiewicz

Title: The Innovations of Peter J Fronczkiewicz

Introduction

Peter J Fronczkiewicz is an accomplished inventor based in Lake Wylie, SC (US). He has made significant contributions to the field of photopolymer technology. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Fronczkiewicz holds a patent for a "Photopolymerizable relief precursor having adjustable surface properties." This invention includes a dimensionally stable carrier and a photopolymerizable relief-forming layer. The layer contains a crosslinkable elastomeric binder, an ethylenically unsaturated monomer, a migration-capable, surface-active additive, and two types of photoinitiators that are activatable with UVA and UVC light. This patent represents a significant advancement in the production of relief structures.

Career Highlights

Fronczkiewicz is currently associated with Xsys Germany GmbH, where he continues to push the boundaries of innovation in his field. His work has been instrumental in developing new materials and processes that enhance the capabilities of photopolymer technology.

Collaborations

He collaborates with notable colleagues such as Matthias Beyer and Armin Becker, contributing to a dynamic and innovative work environment. Their combined expertise fosters creativity and leads to groundbreaking advancements in their projects.

Conclusion

Peter J Fronczkiewicz is a notable inventor whose work in photopolymer technology has made a lasting impact. His patent and collaborations reflect his commitment to innovation and excellence in his field.