The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Dec. 14, 2020
Applicant:
Xsys Germany Gmbh, Willstatt, DE;
Inventors:
Matthias Beyer, Weinheim, DE;
Armin Becker, Großniedesheim, DE;
Torben Wendland, Renningen, DE;
Isabel Schlegel, Rastatt, DE;
Peter J Fronczkiewicz, Lake Wylie, SC (US);
Anja Wundling, Rheinau, DE;
Assignee:
XSYS GERMANY GMBH, Willstatt, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/029 (2006.01); G03F 7/031 (2006.01); G03F 7/095 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); G03F 7/029 (2013.01); G03F 7/031 (2013.01); G03F 7/095 (2013.01); G03F 7/2024 (2013.01);
Abstract
A photopolymerisable relief precursor includes a dimensionally stable carrier, and a photopolymerisable relief-forming layer at least containing a crosslinkable elastomeric binder, an ethylenically unsaturated monomer, a migration-capable, surface-active additive, a photoinitiator activatable with UVA light and a photoinitiator activatable with UVC light. A method for producing a relief structure.