Torben Wendland

Title: Torben Wendland: Innovator in Photopolymer Technology

Introduction

Torben Wendland is a notable inventor based in Renningen, Germany. He has made significant contributions to the field of photopolymer technology, holding 2 patents that showcase his innovative approach to creating relief structures.

Latest Patents

Wendland's latest patents include a photopolymerizable relief precursor that features adjustable surface properties. This precursor consists of a dimensionally stable carrier and a relief-forming layer that contains a crosslinkable elastomeric binder, an ethylenically unsaturated monomer, a migration-capable, surface-active additive, and photoinitiators activatable with UVA and UVC light. Additionally, he has developed a method for thermally developing relief precursors, which involves fixing a relief precursor to a movable support and repeatedly moving the support through various movement cycles. This method enhances the registration accuracy of printing elements and addresses heat build-up issues.

Career Highlights

Throughout his career, Wendland has worked with prominent companies in the industry, including Flint Group Germany GmbH and XSYS Germany GmbH. His experience in these organizations has allowed him to refine his skills and contribute to advancements in photopolymer technology.

Collaborations

Wendland has collaborated with notable professionals in his field, including Peter Fronczkiewicz and Andrew Knapp. These collaborations have further enriched his work and expanded the impact of his innovations.

Conclusion

Torben Wendland's contributions to photopolymer technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in relief structures and printing technologies.