Saal, Germany

Peter Holfelder-Schwalme

This inventor holds 2 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignee: Eos Gmbh Electro Optical Systems. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter Holfelder-Schwalme. Retrieved from https://idiyas.com/inventor/peter-holfelder-schwalme

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Peter Holfelder-Schwalme: Additive Manufacturing Innovation

Introduction

Peter Holfelder-Schwalme is an inventor based in Saal, Germany. His patent work concerns control data for additive manufacturing, with a focus on managing an energy beam as it forms a component layer by layer.

Latest Patents

Holfelder-Schwalme is named on 1 patent: “Method and Device for Generating Control Data for an Additive Manufacturing Device.” The invention describes moving an energy beam along solidification paths across a construction field. In a mode called “toothing mode,” the beam’s desired welding-in depth switches at multiple randomly distributed points within a defined region of the component’s cross-section. This approach provides a method for varying beam penetration during the manufacturing process.

Career Highlights

Holfelder-Schwalme is associated with EOS GmbH Electro Optical Systems, a company focused on additive manufacturing technologies. His patented work addresses the generation of control data used to guide manufacturing equipment.

Collaborations

His patent connects his inventive work with EOS GmbH Electro Optical Systems. The available information identifies the company but does not specify additional collaborators.

Conclusion

Peter Holfelder-Schwalme’s patent focuses on controlling energy-beam penetration in additive manufacturing, reflecting a technical contribution to the precision and operation of layer-based production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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