Wiesbaden, Germany

Peter Heiland

This inventor holds 1 USPTO granted patent. Top assignee: Asm Lithography. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter Heiland. Retrieved from https://idiyas.com/inventor/peter-heiland-qbsf8apn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Peter Heiland

Introduction

Peter Heiland is a notable inventor based in Wiesbaden, Germany. He is recognized for his innovative work in the field of lithography and supporting devices. His contributions have significantly impacted the design and functionality of various technological applications.

Latest Patents

Peter Heiland holds a patent for a "Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices." This invention features a supporting device that includes a first part, a second part, and a gas spring. The gas spring comprises a pressure chamber, which is bounded by a displaceable piston. This design allows for a low stiffness, which is crucial for preventing the transmission of vibrations between the two parts. The invention also encompasses a lithography device that utilizes multiple such supporting devices.

Career Highlights

Heiland is currently associated with Asm Lithography, a company that specializes in advanced lithography technologies. His work at Asm Lithography has allowed him to contribute to cutting-edge innovations in the field.

Collaborations

Heiland collaborates with Erik Roelof Loopstra, enhancing the development of innovative solutions in their projects.

Conclusion

Peter Heiland's contributions to the field of lithography and supporting devices demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in technology, showcasing the importance of effective design in engineering applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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