Asm Lithography

Peter Heiland

Erik Roelof Loopstra

A supporting device (,) provided with a first part (,), a second part (,), and a gas spring (,) for supporting the second part relative to the first part parallel to a support direction (Z). The gas spring (,) comprises a pressure chamber (,) which is provided in an intermediate part (,) and is bounded by a piston (,) which is displaceable in the intermediate part (,) parallel to the support direction and is supported perpendicularly to the support direction by means of a static gas bearing (,). A stiffness of the supporting device parallel to the support direction is thus substantially entirely determined by a stiffness of the gas spring, and a low stiffness can be achieved through a suitable design of the gas spring. A transmission of vibrations directed parallel to the support direction from the first part to the second part is prevented as much as possible thereby. The invention also relates to a lithography device having a plurality of such supporting devices.

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Wiesbaden, Germany

Peter Heiland