Peter H Kranen

Title: The Innovative Contributions of Peter H Kranen

Introduction

Peter H Kranen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work has been instrumental in advancing manufacturing methods for semiconductor devices.

Latest Patents

Kranen's latest patents include a method of manufacturing a semiconductor device that involves forming a spacer from a second layer in a fully self-registering manner. This innovative approach ensures that the spacer is created after a layer portion of a first layer has been established. The process includes the use of a masking layer that is thicker next to the layer portion than above it, allowing for precise etching and protection of the underlying layers. Another patent details a method of defining a device area in a semiconductor body by forming a step with a side wall and top surface, which is crucial for the effective introduction of dopant impurities and the subsequent formation of silicon regions for device contact.

Career Highlights

Peter H Kranen is currently associated with U.S. Philips Corporation, where he continues to contribute to semiconductor innovations. His expertise in manufacturing techniques has positioned him as a key figure in the industry.

Collaborations

Kranen has worked alongside notable colleagues such as Henricus G Maas and Johannes W Van Der Velden, contributing to a collaborative environment that fosters innovation and development in semiconductor technology.

Conclusion

Peter H Kranen's work in semiconductor manufacturing has led to significant advancements in the field. His patents reflect a deep understanding of the complexities involved in semiconductor device production. His contributions continue to influence the industry positively.