The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 1990
Filed:
Mar. 03, 1988
Henricus G Maas, Eindhoven, NL;
Johannes W Van Der Velden, Eindhoven, NL;
Peter H Kranen, Eindhoven, NL;
Albertus T Van De Goor, Eindhoven, NL;
Date J Noorlag, Eindhoven, NL;
U.S. Philips Corp., New York, NY (US);
Abstract
A semiconductor device comprising a first region, which is laterally bounded by a second region comprising a countersunk oxide layer and a highly doped polycrystalline silicon layer, which is disposed thereon and is covered by an oxide layer partly countersunk into it. The side edge of the polysilicon layer adjoins a contact zone, which is obtained by diffusion therefrom and is connected via a current path to a zone of a semiconductor circuit element. The upper side of the polysilicon layer is located at a higher level than that of the first region and the contact zone is connected to the said zone of the semiconductor circuit element via an intermediate region located in the first region below the second oxide layer and having a lower doping than the contact zone.