Peter H Chen

Title: Innovations by Peter H Chen

Introduction

Peter H Chen is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of plasma processing technology. His innovative methods have advanced the efficiency of etching processes in semiconductor manufacturing.

Latest Patents

Peter H Chen holds a patent titled "Methods for reducing etch rate loading while etching through a titanium." This patent describes a method in a plasma processing chamber for etching through selected layers of a wafer stack. The wafer stack includes an anti-reflective layer and a metallization layer. The method involves etching through the anti-reflective layer using a first chemistry that contains both an etchant chemical and a polymer-forming chemical. Additionally, it includes etching through the metallization layer with a second chemistry that differs from the first.

Career Highlights

Peter H Chen is associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on enhancing etching techniques, which are crucial for the production of advanced semiconductor devices. His innovative approaches have contributed to the efficiency and effectiveness of manufacturing processes.

Collaborations

Peter has collaborated with notable colleagues, including Jerry Yang and Susan C Abraham. Their combined expertise has fostered advancements in the field of semiconductor technology.

Conclusion

Peter H Chen's contributions to the field of plasma processing and etching methods have made a significant impact on semiconductor manufacturing. His innovative patent reflects his dedication to improving technology in this critical industry.