Peter Graf

Title: Innovations of Peter Graf in Optical Systems

Introduction

Peter Graf is a notable inventor based in Königsbronn, Germany. He has made significant contributions to the field of optical systems, particularly in lithography technology. With a total of two patents to his name, Graf's work has had a considerable impact on semiconductor manufacturing processes.

Latest Patents

Graf's latest patents include an optical element designed for lithography systems. This optical element features an optical surface and a photoresistor that adjusts its electric value based on the light incident on the surface. Another significant patent is for a projection exposure system for semiconductor lithography, which incorporates an optical arrangement with an actuator embedded in the optical element. This actuator is strategically placed outside the optically effective surface, allowing for the deformation of the surface to enhance performance.

Career Highlights

Peter Graf is currently employed at Carl Zeiss SMT GmbH, a leading company in optical and lithography technology. His work at this esteemed organization has allowed him to develop innovative solutions that advance the capabilities of semiconductor lithography.

Collaborations

Graf has collaborated with notable colleagues such as Norbert Wabra and Reimar Finken. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the optical field.

Conclusion

Peter Graf's contributions to optical systems and lithography technology exemplify the importance of innovation in the semiconductor industry. His patents and collaborations continue to influence advancements in this critical area of technology.