Carl Zeiss Smt Gmbh

Peter Graf

Norbert Wabra

Reimar Finken

Sonja Schneider

Ferdinand Djuric-Rissner

Judith Fingerhuth

Johannes Kimling

An optical element for a lithography system comprises an optical surface and a photoresistor having an electric photoresistor value that varies according to an amount of light incident on a region of the optical surface.

Optical element, optical system, lithography system, and method for operating an optical element

A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

Projection exposure system for semiconductor lithography having an optical arrangement

Growing community of inventors

Königsbronn, Germany

Peter Graf