Heverlee, Belgium

Peter De Bisschop

This inventor holds 1 USPTO granted patent. Top assignees: Cameca, Imec Vzw. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter De Bisschop. Retrieved from https://idiyas.com/inventor/peter-de-bisschop-zow9vxpz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: The Innovations of Peter De Bisschop

Introduction

Peter De Bisschop is a notable inventor based in Heverlee, Belgium. He has made significant contributions to the field of sample analysis through his innovative methods. His work has been recognized in the form of patents, showcasing his expertise and creativity in the scientific community.

Latest Patents

Peter De Bisschop holds a patent for a "Method for sample analysis by sputtering with a particle beam." This patent describes a method for analyzing a sample by sputtering, utilizing a particle beam, along with a device designed to implement this method. His innovative approach has the potential to enhance the accuracy and efficiency of sample analysis.

Career Highlights

Throughout his career, Peter has worked with prominent companies such as Imec Vzw and Cameca. His experience in these organizations has allowed him to develop and refine his skills in the field of sample analysis and particle beam technology. His contributions have been instrumental in advancing research and development in these areas.

Collaborations

Peter has collaborated with esteemed colleagues, including Wielfried Vandervorst and Bernard Rasser. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Peter De Bisschop is a distinguished inventor whose work in sample analysis has made a significant impact in the field. His patent and collaborations reflect his dedication to advancing technology and scientific understanding. His contributions continue to inspire future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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