Chaska, MN, United States of America

Peter D Doenges

This inventor holds 1 USPTO granted patent. Top assignee: Entegris, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter D Doenges. Retrieved from https://idiyas.com/inventor/peter-d-doenges

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Peter D. Doenges and Wafer Container Innovation.

Introduction

Peter D. Doenges is an inventor associated with Chaska, Minnesota, and Entegris, Inc. His patent work addresses the distribution of purge gas inside wafer containers used to protect and handle semiconductor wafers.

Latest Patents

The provided information identifies one patent for Doenges: “Wafer Container and Purge System.” The invention positions diffusers closer to the container’s center line to improve purge-gas distribution. The diffusers may align with a recessed central panel on the back wall, and their relative angle around the wafer’s center may be 60 degrees or less. Offset connectors can place the diffusers closer to the center line than the purge ports, with the distance from each diffuser to the center line less than one quarter of the accommodated wafer’s diameter. Doenges is credited with 1 patent.

Career Highlights

Doenges’s listed work connects him with Entegris, Inc., a company serving the semiconductor industry. His patent focuses on wafer-container design and purge-system performance, with diffuser placement intended to improve gas distribution.

Collaborations

Matthew A. Fuller is identified as Doenges’s coworker. The available information does not specify whether Fuller collaborated on the patent.

Conclusion

Peter D. Doenges’s patent reflects a practical innovation in semiconductor wafer handling, using carefully positioned diffusers to improve purge-gas distribution within a wafer container.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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