Penny M Mullen

Title: The Innovative Contributions of Penny M Mullen

Introduction

Penny M Mullen is a notable inventor based in Howell, NJ (US), recognized for her significant contributions to the field of photographic technology. With a total of three patents to her name, Mullen has made strides in enhancing the quality and durability of photographic films.

Latest Patents

One of her latest patents is titled "Reduced Scratch Sensitization in Nucleated Photographic Film." This invention presents a hybrid lith photographic film that is substantially resistant to the formation of scratch-related defects during manufacturing and handling. It features an anti-abrasion coating on the silver halide emulsion layer, which contains a polyalkylene oxide surfactant. Another significant patent is "Photographic Contrast Promoting Agents." This patent involves photographic film nucleating agents comprising aryl sulfonamidophenyl hydrazides with various substituted functionalities. These nucleators enhance dot quality and contrast characteristics in image-wise exposed film elements, while also ensuring compatibility with standard rapid access developers.

Career Highlights

Penny Mullen is currently employed at Sun Chemical Corporation, where she continues to innovate and contribute to advancements in photographic technology. Her work has not only improved the quality of photographic films but has also addressed common issues faced in the industry.

Collaborations

Throughout her career, Mullen has collaborated with talented individuals such as John F Pilot and Syeda Husain. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Penny M Mullen's contributions to the field of photographic technology through her patents and collaborations highlight her role as a leading inventor. Her work continues to influence the industry and improve the quality of photographic products.