The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1997
Filed:
Aug. 30, 1996
Applicant:
Inventors:
John F Pilot, Carteret, NJ (US);
Shirley M Madamba, Middletown, NJ (US);
Penny M Mullen, Howell, NJ (US);
Assignee:
Sun Chemical Corporation, Fort Lee, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430264 ; 430523 ; 430961 ;
Abstract
A hybrid lith photographic film substantially resistant to the formation of scratch-related defects that occur during the manufacturing and handling process having an anti-abrasion coating on the silver halide emulsion layer containing a polyalkylene oxide surfactant.
Pilot, John. (1997). Reduced scratch sensitization in nucleated photographic film (U.S. Patent No. 5702864). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5702864
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile