Penggang Han

Title: Penggang Han - Innovator in Semiconductor Technology

Introduction

Penggang Han is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique etching method that enhances semiconductor device fabrication.

Latest Patents

Penggang Han holds a patent for an etching method and a semiconductor device. This patent, which is pivotal in the semiconductor device etching process, outlines a method that includes providing a substrate with a film layer to be etched. The process involves forming a mask layer structure on the film layer, which consists of a dielectric layer and an APF layer. The method further details the steps of patterning the APF layer, performing a first etching process using the patterned APF layer as a mask, and subsequently removing the patterned APF layer. This innovative approach is crucial for improving the efficiency and precision of semiconductor manufacturing.

Career Highlights

Penggang Han is currently employed at Shanghai Huali Integrated Circuit Manufacturing Co., Ltd. His role at the company allows him to apply his expertise in semiconductor technology and contribute to the advancement of integrated circuit manufacturing. His work is characterized by a commitment to innovation and excellence in the field.

Collaborations

Penggang Han collaborates with his coworker, Pengkai Xu, to further enhance their research and development efforts in semiconductor technology. Their combined expertise fosters a productive environment for innovation.

Conclusion

Penggang Han is a distinguished inventor whose contributions to semiconductor technology are noteworthy. His patent for an etching method exemplifies his innovative spirit and dedication to advancing the field. Through his work at Shanghai Huali Integrated Circuit Manufacturing Co., Ltd., he continues to make significant strides in semiconductor device fabrication.