This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Innovations of Peng Guo in Plasma Measurement
Introduction
Peng Guo is a notable inventor based in Nanchang, China. He has made significant contributions to the field of plasma measurement through his innovative methods. His work focuses on the nonextensive parameters of plasma, which are crucial for various applications in physics and engineering.
Latest Patents
Peng Guo holds a patent titled "Method for measuring plasma ion nonextensive parameter." This invention relates to a method that describes plasma using nonextensive statistical mechanics. The process involves obtaining an equation that describes the relationship between the geodesic acoustic mode frequency and the ion acoustic speed of plasma. The method includes collecting measurement data of the geodesic acoustic mode frequencies and plasma temperature, which are then used to derive the ion nonextensive parameter numerically. This invention addresses a gap in the diagnosis of ion nonextensive parameters, complementing existing methods for measuring electron nonextensive parameters.
Career Highlights
Peng Guo is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has garnered attention for its innovative approach to measuring complex plasma parameters. With a focus on practical applications, his research contributes to the broader understanding of plasma behavior in various environments.
Collaborations
Peng Guo has collaborated with notable colleagues, including Huibin Qiu and Zuozhi Hu. These collaborations enhance the research output and foster a productive academic environment.
Conclusion
Peng Guo's contributions to the field of plasma measurement through his innovative patent demonstrate his expertise and commitment to advancing scientific knowledge. His work not only fills existing gaps in the field but also paves the way for future research and applications in plasma physics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile