Peng Chao-Chi

Title: Peng Chao-Chi: Innovator in Field Emission Display Technology

Introduction

Peng Chao-Chi is a notable inventor based in Chinchu, Taiwan. He has made significant contributions to the field of flat panel display technology, particularly through his innovative methods for manufacturing high aspect-ratio field emitters.

Latest Patents

Peng Chao-Chi holds a patent for a "Method of manufacturing high aspect-ratio field emitters for flat panel." This groundbreaking method involves forming an array of parallel cathodes on an insulated substrate. Following this, a dielectric layer is deposited, and an array of parallel gate electrodes is formed, which are essentially orthogonal to the cathode electrodes. Openings are then created in the upper gate electrodes and dielectric layer over the lower cathode electrodes. High aspect-ratio field emitters are formed on the cathodes by depositing an emitter material, such as molybdenum, while heating the substrate to high temperatures. This high-temperature method enhances the performance of the circuit by allowing for an increased inter-electrode dielectric layer.

Career Highlights

Peng Chao-Chi is affiliated with the Industrial Technology Research Institute, where he continues to advance research in display technologies. His work has been pivotal in improving the efficiency and performance of flat panel displays.

Collaborations

He has collaborated with notable colleagues, including Ching-Yuan Lin and Kyan-Lun Chang, contributing to the advancement of technology in their field.

Conclusion

Peng Chao-Chi's innovative methods in the manufacturing of high aspect-ratio field emitters have significantly impacted the field of flat panel displays. His contributions continue to influence advancements in display technology.