Guangzhou, China

Peiyan Gui

This inventor holds 2 USPTO granted patents. Top assignee: Guangzhou Heygears Imc. Inc. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peiyan Gui. Retrieved from https://idiyas.com/inventor/peiyan-gui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.8

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Peiyan Gui - Innovator in 3D Printer Calibration

Introduction

Peiyan Gui is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of 3D printing technology. His innovative approach focuses on enhancing the accuracy and efficiency of 3D printers through optical calibration methods.

Latest Patents

Peiyan Gui holds a patent for a "Method and system for optical calibration of 3D printer." This patent outlines a comprehensive method that includes projecting an image onto a platform, placing a calibration plate, and capturing the projection. The process involves identifying calibration points and actual projection points to calculate necessary adjustments, ultimately improving the precision of 3D printing.

Career Highlights

Gui is currently associated with Guangzhou Heygears Inc. His work has been instrumental in advancing the capabilities of 3D printing technology. With a focus on optical calibration, he has developed methods that are crucial for achieving high-quality prints.

Collaborations

Peiyan Gui collaborates with talented individuals such as Xin Wan and Weitao Li. Their combined expertise contributes to the innovative projects at Guangzhou Heygears Inc.

Conclusion

Peiyan Gui's contributions to 3D printing technology through his patented methods demonstrate his commitment to innovation. His work continues to influence the industry, paving the way for more precise and efficient 3D printing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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