Peiran Gao

Title: Peiran Gao - Innovator in Optical Proximity Correction

Introduction

Peiran Gao is a notable inventor based in Irvine, California. He has made significant contributions to the field of optical proximity correction (OPC), a crucial technique in the lithography process used in integrated circuit manufacturing. His innovative approach aims to enhance the accuracy and efficiency of IC production.

Latest Patents

Peiran Gao holds a patent for "Optical proximity correction using regression." This invention addresses the challenges of optical distortions and process effects by modifying design patterns used during lithography. The patent outlines a method that utilizes a regression OPC model to estimate fragment movements of a desired design layout pattern. By providing these initial movements to a reference OPC model, the invention reduces the number of iterations required, thereby decreasing computation time and improving efficiency.

Career Highlights

Peiran Gao is affiliated with the University of California, where he continues to advance research in optical proximity correction. His work has been instrumental in bridging the gap between theoretical models and practical applications in semiconductor manufacturing.

Collaborations

Peiran has collaborated with esteemed colleagues such as Allan Gu and Avideh Zakhor. Their combined expertise has contributed to the development of innovative solutions in the field of optical proximity correction.

Conclusion

Peiran Gao's contributions to optical proximity correction exemplify the impact of innovative thinking in technology. His patent not only enhances the efficiency of IC production but also showcases the importance of collaboration in advancing research.