Peimeng Wang

Title: Peimeng Wang: Innovator in Semiconductor Technology

Introduction

Peimeng Wang is a notable inventor based in Hefei, China. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for manufacturing semiconductor structures, which are crucial for modern electronic devices.

Latest Patents

Wang's latest patents include a semiconductor structure and a forming method thereof. This application provides a detailed method for forming a semiconductor structure, which involves creating a capacitor base that includes multiple capacitor switching structures and an isolation layer. The process includes removing the isolation layer, oxidizing the surface of the capacitor base, and forming an oxide layer. Another significant patent is a method for manufacturing a bit line structure, which outlines the steps for forming a bit line conductive layer on a semiconductor substrate, including the creation of protective and barrier layers.

Career Highlights

Peimeng Wang is currently employed at Changxin Memory Technologies, Inc., where he continues to advance semiconductor technology. His expertise in this field has positioned him as a key player in the development of innovative solutions for memory technologies.

Collaborations

Wang collaborates with fellow inventor Ning Xi, contributing to the advancement of semiconductor research and development.

Conclusion

Peimeng Wang's contributions to semiconductor technology through his patents and work at Changxin Memory Technologies, Inc. highlight his role as an influential inventor in the industry. His innovative methods are paving the way for future advancements in electronics.