Chandler, AZ, United States of America

Peijun Chen

This inventor holds 3 USPTO granted patents. Top assignee: Asm IP Holding B.v.. Active years: 2020-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peijun Chen. Retrieved from https://idiyas.com/inventor/peijun-chen-q6i3eu1z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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3 patents (USPTO):Explore Patents

Title: Peijun Chen: Innovator in Silicon Nitride Film Technologies

Introduction

Peijun Chen is a notable inventor based in Chandler, AZ, who has made significant contributions to the field of material science. With a focus on developing advanced methods for forming doped silicon nitride films, Chen has been awarded a total of 3 patents throughout his career. His innovative approaches have the potential to enhance various applications in semiconductor technology.

Latest Patents

Chen's latest patents include groundbreaking methods and systems for forming doped silicon nitride films. One of his patents describes a method of forming a doped silicon nitride film on a substrate surface. This method involves creating a silicon nitride layer using a first thermal process, followed by a second thermal process to form the doped silicon nitride film. Another patent outlines a cyclical deposition process for depositing a material film on a substrate within a reaction chamber. This method includes multiple steps, such as contacting the substrate with vapor phase reactants and purging the reaction chamber, ensuring a consistent concentration of reactants during the process.

Career Highlights

Peijun Chen is currently employed at ASML Holding B.V., a leading company in the semiconductor industry. His work focuses on advancing technologies that are crucial for the development of next-generation electronic devices. Chen's expertise in material deposition techniques has positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Chen has collaborated with esteemed colleagues such as Petri Raisanen and Mark Olstad. These partnerships have fostered an environment of innovation and have contributed to the successful development of new technologies.

Conclusion

Peijun Chen's contributions to the field of material science, particularly in the area of doped silicon nitride films, highlight his role as an influential inventor. His patents and ongoing work at ASML Holding B.V. continue to push the boundaries of technology in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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