Peijiao Fang

Title: Peijiao Fang: Innovator in Pulsed Voltage Waveform Technology

Introduction

Peijiao Fang is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of physical vapor deposition (PVD) technology. His innovative approach focuses on enhancing the efficiency of material deposition processes.

Latest Patents

Peijiao Fang holds 1 patent for his invention titled "Pulsed voltage waveform delivery for deposition." This patent describes a method that includes sputtering material from a PVD target within a processing chamber. The sputtered material is filtered by an electrode, allowing a first portion to pass through apertures and deposit on a substrate. The process involves delivering a pulsed voltage waveform to an additional electrode, which applies a pulsed DC bias, achieving an etch-to-deposition ratio greater than or equal to 0.5.

Career Highlights

Peijiao Fang is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing deposition techniques that are crucial for manufacturing high-performance electronic devices.

Collaborations

Peijiao Fang collaborates with fellow inventor Chengyu Liu, contributing to innovative projects within the company. Their combined expertise enhances the development of cutting-edge technologies in the field.

Conclusion

Peijiao Fang's contributions to pulsed voltage waveform technology exemplify his commitment to innovation in the PVD sector. His work continues to influence advancements in material deposition processes, showcasing the importance of inventive minds in technology.