This inventor holds 2 USPTO granted patents. Top assignees: Applied Materials, Inc., Other. Active years: 2001-2003.
Company Filing History:
1 out of 14,418 
1 out of 834,411 Years Active: 2001-2003
Title: Pei Wei Yeh: Innovator in Chemical Mechanical Polishing Technology
Introduction
Pei Wei Yeh is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 2 patents. His innovative designs and methods have enhanced the efficiency and effectiveness of polishing machines.
Latest Patents
One of his latest patents is a diaphragm for a chemical mechanical polisher. This diaphragm is composed of a rubber layer and a fiber layer, designed to prevent creasing and reduce friction between the rotary unit and holder. The fibrous layer enhances the diaphragm's strength, improving its lifespan and reducing maintenance frequency. Another significant patent is a method and apparatus for preventing particle contamination in a polishing machine. This invention utilizes a novel method to dispense cleaning solvents onto chamber components, effectively removing slurry deposits and minimizing contamination sources.
Career Highlights
Pei Wei Yeh has worked with prominent companies, including Applied Materials, Inc. His experience in the industry has allowed him to develop practical solutions that address common challenges in chemical mechanical polishing.
Collaborations
Throughout his career, Pei Wei Yeh has collaborated with talented individuals such as Chih-Chiang Yang and Yung-Tai Tseng. These partnerships have contributed to the advancement of his innovative projects.
Conclusion
Pei Wei Yeh's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions that enhance performance and reliability.