Kaohsiung, Taiwan

Pei-Shan Shih

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Powerchip Technology Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pei-Shan Shih. Retrieved from https://idiyas.com/inventor/pei-shan-shih

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Pei-Shan Shih: Innovator in Photolithography Detection

Introduction

Pei-Shan Shih is a notable inventor based in Kaohsiung, Taiwan. She has made significant contributions to the field of photolithography, particularly in the detection of hotspots that can affect the quality of semiconductor manufacturing.

Latest Patents

Pei-Shan Shih holds a patent for a "Method of detecting photolithographic hotspots." This innovative method involves conducting an aerial image simulation after receiving layout data. The process extracts aerial image intensity indices, which are then used to generate various aerial image detectors. The effectiveness of these detectors is verified to accurately determine the position and type of photolithographic hotspots.

Career Highlights

Pei-Shan is currently employed at Powerchip Technology Corporation, a leading company in the semiconductor industry. Her work focuses on enhancing the precision and reliability of photolithographic processes, which are critical in the production of integrated circuits.

Collaborations

Pei-Shan collaborates with talented coworkers, including Yi-Shiang Chang and Chia-Chi Lin. Their combined expertise contributes to the advancement of technologies in their field.

Conclusion

Pei-Shan Shih's innovative work in detecting photolithographic hotspots showcases her valuable contributions to semiconductor technology. Her patent reflects her commitment to improving manufacturing processes and ensuring high-quality outcomes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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