Hsinchu, Taiwan

Pei-Nong Lu

This inventor holds 1 USPTO granted patent. Top assignee: Chunghwa Picture Tubes, Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pei-Nong Lu. Retrieved from https://idiyas.com/inventor/pei-nong-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Pei-Nong Lu: Innovator in Pixel Structure Manufacturing

Introduction

Pei-Nong Lu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of manufacturing methods for pixel structures. His innovative approach has led to the development of a unique forming method for via holes, which is essential in the production of advanced display technologies.

Latest Patents

Pei-Nong Lu holds a patent for a "Forming method of via hole and manufacturing method of pixel structure." This invention provides a detailed process for creating a via hole by sequentially stacking conductive and insulating layers on a substrate. The method includes the use of a photosensitive material layer that is exposed and developed to form via holes, ultimately leading to the manufacturing of pixel structures.

Career Highlights

Pei-Nong Lu is currently employed at Chunghwa Picture Tubes, Ltd., where he applies his expertise in display technology. His work has been instrumental in advancing the methods used in the production of high-quality display panels.

Collaborations

Throughout his career, Pei-Nong Lu has collaborated with talented individuals such as Chin-Tzu Kao and Chien-Pang Tai. These collaborations have fostered an environment of innovation and creativity, contributing to the success of their projects.

Conclusion

Pei-Nong Lu's contributions to the field of pixel structure manufacturing highlight his role as an innovator in display technology. His patent and collaborative efforts continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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