Singapore, Singapore

Pei Ching Lee


Average Co-Inventor Count = 3.8

ph-index = 5

Forward Citations = 95(Granted Patents)


Company Filing History:


Years Active: 1999-2002

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5 patents (USPTO):Explore Patents

Title: **Pei Ching Lee: A Pioneer in Semiconductor Process Innovations**

Introduction:

Pei Ching Lee is a prominent inventor based in Singapore, known for her significant contributions to the field of semiconductor manufacturing. With a total of five patents to her name, she has been at the forefront of developing innovative processes that have enhanced the efficiency and effectiveness of microelectronics fabrication.

Latest Patents:

Among her latest innovations, Pei Ching Lee has developed a **multiple-step plasma etching process for silicon nitride**. This method involves a dry plasma selective etching of patterns in a silicon nitride dielectric layer that is crucial in semiconductor substrates. The process consists of a structured sequence, including a "break-through" etching step, a "bulk" etching step to remove the majority of the silicon nitride, a "buffer" etching step for the fine removal, and an "over-etch" step to ensure complete removal without damaging underlying materials. Her work notably maintains control over critical dimensions and minimizes issues related to microloading and excessive over-etching.

Another groundbreaking patent she has developed is a **method of forming a sidewall spacer and a salicide blocking shape, using only one silicon nitride layer**. This innovative process allows for the simultaneous production of both salicided and non-salicided CMOS devices on the same semiconductor substrate, simplifying the manufacturing process. Key to this procedure is a disposable organic spacer, empowering efficient definition of heavily doped source/drain regions across all CMOS devices, thereby streamlining production while maintaining quality.

Career Highlights:

Pei Ching Lee is currently associated with Chartered Semiconductor Manufacturing Ltd, where her expertise in semiconductor processes has significantly advanced product development. Her career has been marked by a commitment to research and innovation, positioning her as a leading figure in the semiconductor industry.

Collaborations:

Within her organization, she collaborates with esteemed colleagues, including Eng Hua Lim and Chong Wee Lim. These partnerships exemplify the spirit of teamwork and knowledge sharing that fuels advancements in semiconductor technology.

Conclusion:

Pei Ching Lee's innovative contributions to semiconductor processes undeniably define her legacy as an inventor. Her patents not only showcase her technical inventiveness but also highlight her deep understanding of the semiconductor industry's needs. As she continues to innovate, Pei Ching Lee stands as an inspiration for future generations of inventors in the field.

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