Pauline Coakley

Title: Pauline Coakley: Innovator in Polymer Chemistry

Introduction

Pauline Coakley is a distinguished inventor based in Dublin, Ireland. She has made significant contributions to the field of polymer chemistry, particularly in the development of photoresists for microlithography. With a total of four patents to her name, her work has had a profound impact on the industry.

Latest Patents

Coakley's latest patents include innovative advancements in anionically polymerizable monomers and polymers. One of her notable inventions is a polymeric photoresist that exhibits excellent dry etch resistance, specifically designed for use in microlithography. This invention involves monomers containing silicon or titanium atoms, which are crucial for creating high-performance photoresists. Another significant patent focuses on photoresist coatings formed by polymerization of di-unsaturated monomers, which can produce either positive or negative tone images depending on the imaging method employed.

Career Highlights

Throughout her career, Coakley has worked with reputable companies such as Loctite (Ireland) Limited and Loctite Corporation. Her experience in these organizations has allowed her to refine her expertise in polymer chemistry and contribute to various innovative projects.

Collaborations

Coakley has collaborated with notable colleagues, including John G. Woods and John Guthrie. These partnerships have further enriched her research and development efforts in the field.

Conclusion

Pauline Coakley is a remarkable inventor whose work in polymer chemistry continues to influence the industry. Her patents reflect her dedication to innovation and her ability to address complex challenges in microlithography.