Loctite (ireland) Limited

Loctite Corporation

Pauline Coakley

John G Woods

John Gregory Woods

John Guthrie

John Rooney

Anionically polymerizable monomers containing at least one silicon or titanium atom form polymeric photoresists having good dry etch resistance for use in microlithography. The monomers are of the formula ##STR1## wherein A is --H or --CH.dbd.CH.sub.2 ; X is a strong electron withdrawing group;

Anionically polymerizable monomers, polymers thereof and use of such

A photoresist coating for use in microlithography comprises a polymer of a monomer of the formula ##STR1## wherein X and Y are strong electron withdrawing groups and R.sup.4 is H or, providing that X and Y are both --CN, R.sup.4 may be aliphatic hydrocarbyl, aryl or alkaryl. Preferred monomers are of the formula ##STR2## wherein R.sup.7 is a C.sub.1 -C.sub.5 alkyl or C.sub.2 -C.sub.5 alkenyl group, more particularly ethyl 2-cyanopenta-2,4-dienoate or allyl 2-cyanopenta-2,4-dienoate. Methods for applying a resist coating by vapor deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed.

Photoresists formed by polymerization of di-unsaturated monomers

The silicon-containing phenoxy ethers are of the formula III: ##STR1## wherein R.sup.1 and R.sup.2 which may be the same or different are selected from H, --R.sup.3 --X, aliphatic hydrocarbyl having 1-6 carbon atoms or aryl, or substituted derivatives thereof, provided that not more than one of R.sup.1 and R.sup.2 is H;

Silicon-containing phenoxy ethers, polymers thereof, and use of such

Cationically polymerizable styryloxy resins having urethane linkages, represented by the formula III ##STR1## wherein R.sup.1 and R.sup.2 are H, or one of R.sup.1 and R.sup.2 is H and the other is methyl;

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Dublin, Ireland

Pauline Coakley