Company Filing History:
Years Active: 2001-2008
Title: Innovations by Pauli Hsueh
Introduction
Pauli Hsueh is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor fabrication, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of integrated circuit structures.
Latest Patents
One of Hsueh's latest patents is titled "Method for forming photomask having test patterns in blading areas." This patent discloses a photomask and a method for forming it, where die regions define features for a semiconductor fabrication process. The innovation includes forming a test pattern for a different process step in a blading area of the photomask. This method allows for the exposure of the photomask to transfer the test pattern to a semiconductor substrate, enabling the formation of test structures without the need for additional photomasks.
Another significant patent by Hsueh is "Reduction of topside movement during temperature cycles." This patent describes an integrated circuit structure that features a patterned uppermost conductive layer with a current-carrying trace. The trace is connected to an underlying substrate through a multi-layer interconnect structure. The design includes a serpentine pattern at the edges of the integrated circuit, which enhances the strength of the topside film structure during thermal cycling.
Career Highlights
Pauli Hsueh is currently employed at Integrated Device Technology, Inc., where he continues to innovate in the semiconductor industry. His work has contributed to advancements in integrated circuit technology, making processes more efficient and reliable.
Collaborations
Hsueh has collaborated with notable colleagues, including Chuen-Der Lien and Chun-Ya Chen. These collaborations have further enriched his contributions to the field.
Conclusion
Pauli Hsueh's innovative patents and contributions to semiconductor technology highlight his role as a significant inventor in the industry. His work continues to influence advancements in integrated circuit design and fabrication.