Newark, DE, United States of America

Paula Beyer Hietpas

This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paula Beyer Hietpas. Retrieved from https://idiyas.com/inventor/paula-beyer-hietpas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 8.0

ph-index = 2

Forward Citations = 191(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):Explore Patents

Title: Innovations by Paula Beyer Hietpas

Introduction

Paula Beyer Hietpas is a notable inventor based in Newark, DE (US). She has made significant contributions to the field of nanotechnology, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

One of her latest patents is a method for providing nano-structures of uniform length. This invention relates to the field of nanotechnology and describes a method for cutting a multiplicity of nano-structures to uniform dimensions of length, width, or area. It also addresses the specific distribution of lengths or area using various cutting techniques.

Career Highlights

Paula currently works at E.I. DuPont de Nemours and Company, where she applies her knowledge and skills in nanotechnology. Her work has been instrumental in advancing the understanding and application of nano-structures in various industries.

Collaborations

Some of her coworkers include Roger Harquail French and Timothy Dee Gierke, who contribute to her innovative projects and research endeavors.

Conclusion

Paula Beyer Hietpas is a pioneering inventor whose work in nanotechnology continues to influence the field. Her patents reflect her commitment to innovation and excellence in research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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