The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2005

Filed:

Apr. 03, 2003
Applicants:

Roger Harquail French, Wilmington, DE (US);

Timothy Gierke, Wilmington, DE (US);

Mark Andrew Harmer, Kennett Square, PA (US);

Anand Jagota, Wilmington, DE (US);

Steven Raymond Lustig, Landenberg, PA (US);

Rakesh H. Mehta, Hockessin, DE (US);

Paula Beyer Hietpas, Newark, DE (US);

Bibiana Onoa, Wilmington, DE (US);

Inventors:

Roger Harquail French, Wilmington, DE (US);

Timothy Gierke, Wilmington, DE (US);

Mark Andrew Harmer, Kennett Square, PA (US);

Anand Jagota, Wilmington, DE (US);

Steven Raymond Lustig, Landenberg, PA (US);

Rakesh H. Mehta, Hockessin, DE (US);

Paula Beyer Hietpas, Newark, DE (US);

Bibiana Onoa, Wilmington, DE (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/00 ; G03D015/00 ;
U.S. Cl.
CPC ...
Abstract

This invention relates to the field of nanotechnology. Specifically the invention describes a method for cutting a multiplicity of nano-structures to uniform dimensions of length, length and width, or area, or to a specific distribution of lengths or area using various cutting techniques.


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