Paul R Unruh

Title: The Innovations of Paul R. Unruh

Introduction

Paul R. Unruh is an accomplished inventor based in Oro Valley, AZ (US). He holds a total of 3 patents that showcase his expertise in optical profiling and measurement technologies. His work has significantly contributed to advancements in the field of object deformation measurement.

Latest Patents

One of his latest patents is titled "Measurement of object deformation with optical profiler." This invention utilizes an interferometric profiler to measure object motion by adjusting the scanner's motion to maintain phase variation within acceptable limits. The manipulation of scanner motion is based on prior knowledge of the object's behavior, pre-calibration, or real-time feedback from current measurements. The object motion is accurately recovered by subtracting the scanner position from the evolving object position during the scan.

Another notable patent is "Film thickness and boundary characterization by interferometric profilometry." This invention employs two threshold parameters to identify intensity modulation peaks at the interfaces of a thin film and adjacent media. The first parameter distinguishes modulation data from noise, while the second separates actual contrast data from high modulation signals that do not result from interference fringes. Valid modulation data is used to calculate the peak of each modulation envelope, allowing for the determination of film thickness at each pixel.

Career Highlights

Paul R. Unruh is currently associated with Veeco Instruments Inc., where he continues to innovate and develop new technologies. His contributions to the field have been recognized through his patents and the impact of his work on optical profiling.

Collaborations

Throughout his career, Paul has collaborated with talented individuals such as Joanna Schmit and Erik Novak. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Paul R. Unruh's work exemplifies the spirit of innovation in the field of optical profiling and measurement technologies. His patents reflect a commitment to advancing the understanding and application of these technologies, making a lasting impact in his field.