The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Feb. 03, 2000
Richard W. Swinford, Tucson, AZ (US);
David J. Aziz, Tucson, AZ (US);
Bryan W. Guenther, Tucson, AZ (US);
Paul R. Unruh, Tucson, AZ (US);
Veeco Instruments Inc., Tucson, AZ (US);
Abstract
Average fringe contrast is determined by PSI measurements at each step of relatively large translations of the reference optics and mirror of a white-light Linnik interference objective and the resulting data are used to minimize the OPD between the reference and test beam paths of the instrument. Utilizing the same algorithms used in the art to perform conventional vertical scanning interferometry, the position of minimum OPD is determined by finding the position of maximum average fringe contrast. Furthermore, by automating the system with a precise translation mechanism, operator-to-operator variations are completely eliminated and the precision of the process of OPD minimization is greatly improved. In another embodiment of the invention, the optimal focal position of the reference mirror is found at the same time by calculating the average lateral variation of fringe contrast as a function of OPD and focal position. The optimal OPD and focal position correspond to the maximum average lateral variation of fringe contrast in the resulting three-dimensional space.