Corona, CA, United States of America

Paul Patel


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2005

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2 patents (USPTO):Explore Patents

Title: Paul Patel - Innovator in Substrate Processing Technologies

Introduction

Paul Patel, an inventive mind based in Corona, CA, has significantly contributed to the field of substrate processing with two notable patents. His work exemplifies a commitment to innovation that addresses practical challenges in the industry.

Latest Patents

Patel's latest inventions include the "Megasonic Cleaner and Dryer System" and "Stackable Process Chambers."

The Megasonic Cleaner and Dryer System features an apparatus with a rotatable chuck that supports a substrate, encompassed by a moveable splash guard. This design effectively prevents fluid from splashing back onto the substrate during the cleaning process, enhancing efficiency and reliability.

The Stackable Process Chambers consist of a dual substrate cleaning system. This configuration allows for a more compact and accessible setup, where the second cleaner is stacked above the first. This enables improved gas flow and access, optimizing the substrate processing workflow.

Career Highlights

Throughout his career, Paul Patel has worked with prominent organizations, including Goldfinger Technologies and the Interuniversitair Microelektronica Centrum (imec). His roles in these companies have allowed him to push the boundaries of technology in substrate cleaning and processing.

Collaborations

Patel has collaborated with talented professionals such as Chad M. Hosack and Raoul Standt. Working alongside such skilled individuals has enriched his career and further advanced the innovations he has been a part of.

Conclusion

Paul Patel is a noteworthy inventor whose contributions to substrate processing technologies have led to the patenting of innovative solutions. His work not only reflects his dedication as an inventor but also his impact on the industry, promising a future where substrate cleaning processes are more efficient and effective.

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