The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2005

Filed:

Jun. 12, 2002
Applicants:

Chad M. Hosack, Dana Point, CA (US);

Jeffrey M. Lauerhaas, Leuven, BE;

Mario E. Bran, Garden Grove, CA (US);

Raoul Standt, Newport Beach, CA (US);

Paul Patel, Corona, CA (US);

Yi Wu, Irvine, CA (US);

Geert Doumen, Maaseik, BE;

Paul Mertens, Bonheiden, BE;

Inventors:

Chad M. Hosack, Dana Point, CA (US);

Jeffrey M. Lauerhaas, Leuven, BE;

Mario E. Bran, Garden Grove, CA (US);

Raoul Standt, Newport Beach, CA (US);

Paul Patel, Corona, CA (US);

Yi Wu, Irvine, CA (US);

Geert Doumen, Maaseik, BE;

Paul Mertens, Bonheiden, BE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F26B017/00 ;
U.S. Cl.
CPC ...
Abstract

An apparatus includes a rotatable chuck for supporting a substrate and a splash guard. The splash guard surrounds the chuck and surrounds a substrate mounted on the chuck. The splash guard has a portion that deflects fluid being flung off the substrate by centrifugal action in a manner so as to not splash back onto the substrate. The splash guard is moveable between a process position in which the upper annular edge of the splash guard extends above the chuck and a substrate on the chuck, and a load/unload position in which the splash guard is tilted so that one side of the upper annular edge is below an upper edge of the chuck. The movement of the splash guard facilitates loading and unloading of a substrate.


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