Dana Point, CA, United States of America

Chad M Hosack


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2005

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2 patents (USPTO):Explore Patents

Title: **Chad M Hosack: Innovator in Substrate Processing Systems**

Introduction

Chad M Hosack, based in Dana Point, California, is a noteworthy inventor with a focus on substrate processing technologies. With a portfolio of two patents, Hosack has made significant contributions to the field of cleaner and dryer systems that enhance efficiency and performance in substrate handling.

Latest Patents

Hosack's latest inventions include the **Megasonic Cleaner and Dryer System** and **Stackable Process Chambers**. The Megasonic Cleaner and Dryer System comprises an apparatus featuring a rotatable chuck that supports a substrate, equipped with a splash guard. This innovative splash guard minimizes the risk of fluid splashing back onto the substrate during the cleaning process, enhancing cleanliness and efficiency. The splash guard can transition between a process position and a load/unload position, facilitating smooth operations when loading or unloading substrates.

The **Stackable Process Chambers** invention consists of a substrate processing system incorporating two substrate cleaners. The first cleaner has a forward portion with a rotatable substrate support, while the rear portion is designed to be thicker, aiding in the rotation of the substrate support. The second cleaner is stacked above the first, maximizing space and ensuring optimal gas flow between the two systems. This innovative design presents advantages in both functionality and space efficiency.

Career Highlights

Throughout his career, Chad has been associated with several notable companies, including Goldfinger Technologies, LLC and Interuniversitair Microelektronica Centrum (imec). His expertise has contributed to advancements in the field, showcasing his commitment to research and innovation.

Collaborations

Chad M Hosack has collaborated with talented individuals in the industry, including Raoul Standt and Paul Patel. These partnerships reflect a shared vision for innovation and the collective ambition to enhance substrate processing technologies.

Conclusion

Chad M Hosack continues to be a pioneering force in substrate processing systems. His inventive spirit and dedication to improving existing technologies have established him as a prominent figure within the innovation landscape. With his recent patents, he is set to contribute even further to the realm of substrate processing.

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