Company Filing History:
Years Active: 2017-2020
Title: The Innovations of Paul Horn
Introduction
Paul Horn is a notable inventor based in Milpitas, CA (US), recognized for his contributions to metrology systems. He holds a total of 8 patents, showcasing his expertise and innovative spirit in the field of technology.
Latest Patents
Among his latest patents is the "All Surface Film Metrology System." This system is designed to perform metrology on various surfaces of a wafer, including the front surface, back surface, and edges. It enables comprehensive wafer metrology and can assess thin films on the back surface of the wafer. The system determines the thickness and optical properties of a thin film by analyzing a greyscale image of light emerging from the back surface compared to a reference wafer. Another significant patent is the "Speed Enhancement of Chromatic Confocal Metrology." This invention utilizes chromatic confocal techniques for height measurements, such as those for bumps, pillars, or film thickness. The system incorporates a white light source and lenses that adjust the focal distance for each wavelength of light, allowing for precise measurements.
Career Highlights
Paul Horn is currently employed at Kla Tencor Corporation, where he continues to innovate and develop advanced metrology solutions. His work has significantly impacted the field, enhancing the accuracy and efficiency of measurements in semiconductor manufacturing.
Collaborations
Throughout his career, Paul has collaborated with talented individuals such as Shifang Li and Lena Nicolaides, contributing to the advancement of metrology technologies.
Conclusion
Paul Horn's contributions to the field of metrology through his innovative patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence the development of advanced measurement systems.