Lucas, TX, United States of America

Paul G Sudak

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Texas Instruments Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul G Sudak. Retrieved from https://idiyas.com/inventor/paul-g-sudak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Paul G. Sudak: Innovator in Semiconductor Technology

Introduction

Paul G. Sudak is a notable inventor based in Lucas, Texas. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to antireflective coatings.

Latest Patents

One of Paul G. Sudak's key patents is titled "Antireflective coating for semiconductor devices and method for the same." This invention describes a semiconductor device that includes a first layer of dielectric material on the upper surface of a substrate and a first non-conductive layer of metal on the dielectric material. The combination of these layers acts as an optical trap for electromagnetic radiation, enhancing the performance of semiconductor devices.

Career Highlights

Paul G. Sudak is associated with Texas Instruments Corporation, a leading company in the semiconductor industry. His work has contributed to advancements in semiconductor technology, showcasing his expertise and innovative spirit.

Collaborations

Throughout his career, Paul has collaborated with talented individuals such as Robert L. Adams and Jason Michael Neidrich. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Paul G. Sudak's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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