Paul E Brunemeier

Title: The Innovative Contributions of Paul E. Brunemeier

Introduction

Paul E. Brunemeier is a notable inventor based in Sunnyvale, California. He holds three patents that showcase his expertise in materials science and plasma processing. His work has significantly impacted the fields of integrated circuits and material optimization.

Latest Patents

One of Brunemeier's latest patents is titled "Inhomogeneous materials having physical properties decoupled from desired functions." This invention involves a composition that includes a first component, which responds to radiation, and a second component. Upon curing, these components form an inhomogeneous material where the physical properties are primarily determined by the second component. This decoupling allows for separate optimization of the material's functions and properties, making it particularly useful in applications like low dielectric constant materials for metal interconnect layers in integrated circuits.

Another significant patent is the "Plasma-enhanced flash process." This method is designed for use in a plasma processing chamber to remove corrosive species after substrate processing. The process involves introducing a flash source gas, such as oxygen, into the chamber and striking a plasma with this gas. This action helps reduce the concentration of corrosive species, enhancing the longevity and efficiency of the processing chamber.

Career Highlights

Brunemeier has had a distinguished career, working with prominent companies in the semiconductor industry. He has been associated with Novellus Systems Incorporated and Lam Research Corporation, where he contributed to advancements in plasma processing and materials science.

Collaborations

Throughout his career, Brunemeier has collaborated with talented individuals, including Archita Sengupta and Justin F. Gaynor. These collaborations have fostered innovation and the development of cutting-edge technologies in their respective fields.

Conclusion

Paul E. Brunemeier's contributions to the fields of materials science and plasma processing are noteworthy. His patents reflect a deep understanding of material optimization and innovative processing techniques. His work continues to influence advancements in integrated circuit technology and beyond.