This inventor holds 4 USPTO granted patents. Top assignee: Eastman-Kodak Company. Active years: 1984-1997.
Company Filing History:

Years Active: 1984-1997
Title: The Innovations of Paul D VanderValk
Introduction
Paul D VanderValk is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photoconductive materials, holding a total of 4 patents. His work primarily focuses on enhancing the performance and reliability of photoconductive elements.
Latest Patents
VanderValk's latest patents include a photoconductive element having a barrier layer. This invention features an electrically conductive support and a photoconductive material that generates positive charge carriers when exposed to actinic radiation. The element incorporates an electrical barrier layer made of a polyester ionomer, which restrains the injection of positive charge carriers from the conductive support. The method involves coating an aqueous dispersion of a polyester ionomer on the conductive support, followed by a charge generation layer and a p-type charge transport layer.
Another significant patent is for photoconductor elements with multiphase stress-dampening interlayers. This improved interlayer is designed for use between an electrically conductive layer and a charge generation layer, where a dye is aggregated in a matrix polymer. The interlayer consists of a mixture of at least one polyester and at least one polycarbonate, providing excellent adhesion and dampening stress on the photoconductive element while minimizing effects on photosensitivity through optimized interlayer thickness.
Career Highlights
VanderValk has spent a considerable part of his career at Eastman Kodak Company, where he has been instrumental in developing innovative photoconductive technologies. His expertise in this area has led to advancements that enhance the functionality and durability of photoconductive elements.
Collaborations
Throughout his career, VanderValk has collaborated with several talented individuals, including Marie B O'Regan and Douglas E Bugner. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Paul D VanderValk's contributions to the field of photoconductive materials are noteworthy. His innovative patents and collaborations have significantly advanced the technology, making him a respected figure in the industry.