Rochester, NY, United States of America

Paul D VanderValk

This inventor holds 4 USPTO granted patents. Top assignee: Eastman-Kodak Company. Active years: 1984-1997.


% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1984-1997

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4 patents (USPTO):Explore Patents

Title: The Innovations of Paul D VanderValk

Introduction

Paul D VanderValk is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photoconductive materials, holding a total of 4 patents. His work primarily focuses on enhancing the performance and reliability of photoconductive elements.

Latest Patents

VanderValk's latest patents include a photoconductive element having a barrier layer. This invention features an electrically conductive support and a photoconductive material that generates positive charge carriers when exposed to actinic radiation. The element incorporates an electrical barrier layer made of a polyester ionomer, which restrains the injection of positive charge carriers from the conductive support. The method involves coating an aqueous dispersion of a polyester ionomer on the conductive support, followed by a charge generation layer and a p-type charge transport layer.

Another significant patent is for photoconductor elements with multiphase stress-dampening interlayers. This improved interlayer is designed for use between an electrically conductive layer and a charge generation layer, where a dye is aggregated in a matrix polymer. The interlayer consists of a mixture of at least one polyester and at least one polycarbonate, providing excellent adhesion and dampening stress on the photoconductive element while minimizing effects on photosensitivity through optimized interlayer thickness.

Career Highlights

VanderValk has spent a considerable part of his career at Eastman Kodak Company, where he has been instrumental in developing innovative photoconductive technologies. His expertise in this area has led to advancements that enhance the functionality and durability of photoconductive elements.

Collaborations

Throughout his career, VanderValk has collaborated with several talented individuals, including Marie B O'Regan and Douglas E Bugner. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Paul D VanderValk's contributions to the field of photoconductive materials are noteworthy. His innovative patents and collaborations have significantly advanced the technology, making him a respected figure in the industry.

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