The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 1991
Filed:
Oct. 30, 1989
Applicant:
Inventors:
Martin A Berwick, Kendall, NY (US);
William T Gruenbaum, Rochester, NY (US);
Paul D VanderValk, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430 60 ; 430 96 ;
Abstract
An improved interlayer is provided for use in a photoconductor element between an electrically conductive layer and a charge generation layer of the type where a dye is aggregated in a matrix polymer. The interlayer is a mixture of at least one polyester and at least one polycarbonate. The interlayer provides excellent adhesion between the conductive layer and the charge generation layer and dampens any stress to which the photoconductive element is subjected. Minimal effect on photosensitivity is achieved by optimizing interlayer thickness.