Montvale, NJ, United States of America

Paul B-l, Chou

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul B-l, Chou. Retrieved from https://idiyas.com/inventor/paul-b-l-chou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 213(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Innovations of Paul B-l, Chou

Introduction

Paul B-l, Chou is an accomplished inventor based in Montvale, NJ (US). He has made significant contributions to the field of automated defect detection and classification systems. His work is particularly relevant in industries such as semiconductor and electronic packaging manufacturing.

Latest Patents

Chou holds a patent for an "Automated defect classification system." This integrated visual defect detection and classification system includes adaptive defect detection and image labeling, defect feature measures, and a knowledge-based inference shell/engine for classification based on fuzzy logic. The combination of these elements provides a method and system for detecting and analyzing product defects across various application domains.

Career Highlights

Chou is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop advanced technologies. His expertise in defect detection has positioned him as a key player in enhancing product quality and reliability.

Collaborations

Some of his notable coworkers include Virginia H Brecher and Robert W Hall, who have collaborated with him on various projects within the company.

Conclusion

Paul B-l, Chou's contributions to automated defect classification systems exemplify the importance of innovation in technology. His work not only advances the field but also ensures higher standards in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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