Company Filing History:
Years Active: 2004-2005
Title: Paul Allan Daniel: Innovator in Ion Implantation Technology
Introduction
Paul Allan Daniel is a notable inventor based in Kittery Point, ME (US). He has made significant contributions to the field of ion implantation technology, holding 2 patents that enhance the efficiency and stability of ion beams in various applications.
Latest Patents
One of his latest patents is titled "Ion implantation systems and methods utilizing a downstream gas source." This invention provides systems and methods that neutralize ion beams in implantation processes by introducing a gas into the ion beam. The introduction of gas increases the generation of electrons in the beam, which neutralizes it and reduces its tendency to diverge. This results in greater beam stability during transport, increasing the beam current delivered to the wafer and improving implant uniformity.
Another significant patent is "Method and apparatus for determining beam parallelism and direction." This invention outlines a method for determining the direction or parallelism of any type of beam, including charged particle beams or electromagnetic radiation beams. The method involves adjusting the intensity profile of the beam at a specific position, allowing for precise measurements of the beam's direction or parallelism.
Career Highlights
Paul Allan Daniel is currently employed at Varian Semiconductor Equipment Associates, Inc., where he continues to innovate in the field of semiconductor equipment. His work focuses on improving ion implantation processes, which are critical in the manufacturing of semiconductors.
Collaborations
Throughout his career, Paul has collaborated with notable colleagues such as Joseph C. Olson and Donna Smatlak. These collaborations have contributed to the advancement of technology in the semiconductor industry.
Conclusion
Paul Allan Daniel's contributions to ion implantation technology through his patents and work at Varian Semiconductor Equipment Associates, Inc. highlight his role as an influential inventor in the field. His innovations continue to impact the efficiency and effectiveness of semiconductor manufacturing processes.