Paul Alejon Fontejon, Jr

Title: Paul Alejon Fontejon, Jr.: Inventor in Vacuum Plasma Processing

Introduction

Paul Alejon Fontejon, Jr. is an inventor associated with Pittsburg, California, and Hitachi Global Storage Technologies Netherlands B.V. His work includes a patent addressing particle contamination in vacuum plasma processing tools.

Latest Patents

The supplied information identifies one patent associated with Fontejon: “In-Situ Method to Reduce Particle Contamination in a Vacuum Plasma Processing Tool.” The invention describes an in-situ technique for reducing particle contamination while a wafer is inside a vacuum tool or deposition chamber. By performing decontamination within the processing equipment, the method can avoid the need for a separate device. It addresses particles that may originate from mechanical components within the tool and integrates decontamination into the vacuum process. The description also notes that performing the process in the presence of plasma under radio-frequency conditions may help maximize self-bias voltage.

Career Highlights

Fontejon’s listed patent reflects work on improving contamination control in semiconductor processing equipment. The supplied data associates him with Hitachi Global Storage Technologies Netherlands B.V. and records 1 patent.

Collaborations

Yinshi Liu and Ning Shi are identified as coworkers associated with Fontejon.

Conclusion

Paul Alejon Fontejon, Jr.’s documented invention focuses on reducing particle contamination directly within vacuum plasma processing equipment, integrating decontamination into the manufacturing process.