The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Jun. 22, 2006
Paul Alejon Fontejon, Jr., Pittsburgh, CA (US);
Yunxiao Gao, Sunnyvale, CA (US);
Yinshi Liu, Foster City, CA (US);
Ning Shi, San Jose, CA (US);
Paul Alejon Fontejon, Jr., Pittsburgh, CA (US);
Yunxiao Gao, Sunnyvale, CA (US);
Yinshi Liu, Foster City, CA (US);
Ning Shi, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands, Amsterdam, NL;
Abstract
The method and apparatus of the embodiments of the present invention employ an in-situ particle decontamination technique that allows for such decontamination while a wafer is a vacuum tool or deposition chamber, thereby eliminating the need for another device for performing decontamination. This in-situ decontamination is effective for particle contamination resulting, for example, from tool resident mechanical component. Furthermore, particle decontamination is performed in the presence of plasma, having a potential for helping to maximize a 'self bias' voltage, under RF conditions, and is integrated into the vacuum process.