Fort Collins, CO, United States of America

Paul A Sullivan

This inventor holds 4 USPTO granted patents. Top assignee: Ncr Corporation. Active years: 1985-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul A Sullivan. Retrieved from https://idiyas.com/inventor/paul-a-sullivan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.8

ph-index = 4

Forward Citations = 247(Granted Patents)


Company Filing History:


Years Active: 1985-1987

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4 patents (USPTO):Explore Patents

Title: The Innovations of Paul A. Sullivan

Introduction

Paul A. Sullivan is a notable inventor based in Fort Collins, Colorado. He has made significant contributions to the field of technology, particularly in the development of advanced semiconductor devices. With a total of 4 patents to his name, Sullivan's work has had a lasting impact on the industry.

Latest Patents

One of his latest patents is a method of fabricating a high density, low power, merged vertical fuse programmable ROM. This invention includes a wafer for a CMOS-type structure that features an emitter, which is overlain by a fuse pad made of undoped polysilicon and a conductive layer. The design incorporates a layer of barrier oxide on the conductive top layer of the fuse pad, along with a sidewall oxide surrounding the periphery of the fuse pad, both of which are covered by a metallic electrical connection. The process for producing this fuse programmable ROM utilizes standard CMOS fabrication techniques, including steps for depositing fuse material and forming electrical connections.

Another significant patent involves the use of selectively deposited tungsten for contact formation and shunting. This process is designed for creating ohmic contacts and contact/interconnect metallization patterns. It allows for the interconnection of fully formed field effect devices using contacts through a dielectric layer. The method includes conformally depositing a thin layer of intrinsic polysilicon or amorphous silicon, which is then patterned and covered by selectively deposited tungsten. An anneal operation forms self-aligned contacts or shunts, enhancing the efficiency of the devices.

Career Highlights

Paul A. Sullivan is currently employed at NCR Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Throughout his career, Sullivan has collaborated with several talented individuals, including Daniel L. Ellsworth and George J. Collins. These partnerships have contributed to the success of his projects and the advancement of technology in his field.

Conclusion

Paul A. Sullivan's contributions to the field of technology through his patents and innovations have established him as a prominent figure in the industry. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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