San Jose, CA, United States of America

Patrick Tae


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Patrick Tae

Introduction

Patrick Tae is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of metrology, particularly in the context of extreme ultraviolet (EUV) lithography. His innovative work has led to the development of a unique patent that enhances the monitoring of light sources used in advanced manufacturing processes.

Latest Patents

Patrick Tae holds a patent for "Confocal chromatic metrology for EUV source condition monitoring." This invention involves a light source that includes a rotatable drum coated with xenon ice, which is illuminated by a laser beam to produce plasma. The drum is designed to be translatable, and the system incorporates a confocal chromatic sensor that measures distances from the sensor to the rotatable drum. The sensor head focuses light onto the drum and detects reflected light, all while being housed within a vacuum chamber. This innovative approach significantly improves the precision of monitoring EUV light sources.

Career Highlights

Patrick Tae is currently employed at Kla Corporation, a leading company in the field of semiconductor manufacturing equipment. His work at Kla Corporation has positioned him as a key player in advancing technologies that are critical for the production of cutting-edge electronic devices. His expertise in metrology and light source monitoring has been instrumental in enhancing the efficiency and accuracy of manufacturing processes.

Collaborations

Throughout his career, Patrick has collaborated with talented individuals such as Caijun Su and Ravichandra Jagannath. These collaborations have fostered an environment of innovation and have contributed to the successful development of advanced technologies in the semiconductor industry.

Conclusion

Patrick Tae's contributions to the field of metrology and his innovative patent demonstrate his commitment to advancing technology in semiconductor manufacturing. His work continues to influence the industry and pave the way for future innovations.

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