Patrick T Chin

Title: The Innovations of Patrick T Chin

Introduction

Patrick T Chin is a notable inventor based in Marina Del Rey, CA. He has made significant contributions to the field of technology, holding a total of 3 patents. His work primarily focuses on advancements in semiconductor technology.

Latest Patents

One of his latest patents is for an interstitial diffusion barrier. This innovation involves a heterojunction bipolar transistor that is doped in the sub-collector layer with phosphorus. The presence of phosphorus causes any interstitial gallium to bond to it and move to a lattice site. As a result, the interstitial gallium does not diffuse to the base layer, preventing the displacement and diffusion of beryllium. Instead of doping with phosphorus, a layer that includes phosphorus can also be utilized. Another significant patent is a method for cleaning phosphorus from a molecular beam epitaxy (MBE) chamber. This method involves freezing a panel within the vacuum chamber onto which excess phosphorus is deposited. The panel is connected to a source of cold nitrogen, which cools it down. Water is then introduced to form a layer of ice on top of the phosphorus. The panel can be removed for cleaning with ice covering the phosphorus, eliminating the risk of ignition.

Career Highlights

Patrick T Chin is currently employed at TRW Limited, where he continues to innovate and develop new technologies. His work has had a substantial impact on the semiconductor industry, showcasing his expertise and dedication to advancing technology.

Collaborations

He has collaborated with notable coworkers, including Augusto L Gutierrez-Aitken and Aaron K Oki. Their combined efforts contribute to the innovative environment at TRW Limited.

Conclusion

Patrick T Chin's contributions to technology through his patents and work at TRW Limited highlight his role as a significant inventor in the field. His innovations continue to influence advancements in semiconductor technology.